Technology research and development

Keyon Process has a R&D base which is of more than 1000 square meters and run by more than 30 technical and engineering staff.Adhering to the principle of “Key on Tech”, Keyon Process is persistently striving for progressive development based on technical innovationto meet the newest demand in the chemical industry.

ECOSA patent- H2Sto H2SO4 process on wet basis, R&D history:

R&D of ECOSA started in 2009. First industrialized ECOSA unit was put into operation in 2013. As for now, Keyon Process has more than 50  ECOSA reference units.

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Address:8 F, Lane2, No406, Guilin Road, Xuhui, District, Shanghai, P.R.China 021-50120846